yun2025 发表于 前天 02:33

Gigaphoton推出hTGM氖气回收系统

Gigaphoton推出hTGM氖气回收系统

2026年9月,三星电子与阿斯麦宣布扩大先进芯片制造合作,重点涉及高数值孔径极紫外光刻和下一代光掩模技术。三星计划参与12英寸光掩模生态建设,推动行业从长期采用的6英寸规格向更大格式探索,以适应高分辨率制造对生产效率和图形处理的要求。

更大的掩模有望减少部分拼接限制,并改善未来先进芯片的制造成本,但也需要配套材料、设备和检测体系共同发展。三星同时提出,计划到2028年把阿斯麦高数值孔径极紫外光刻引入未来DRAM的大规模生产。该技术利用更高成像分辨率,支持存储器继续缩小结构尺寸,并可能简化部分工艺。双方将结合存储与逻辑制造经验推进研发。需要注意,公告中的2028年属于计划时间,12英寸掩模也仍涉及产业协同和基础设施准备。此次合作体现出芯片微缩越来越依赖设备、材料与制造商共同设计,而非单独提高某一项设备参数。

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汐若初见 发表于 前天 02:42

写的真的很不错
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